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PM216L vacuum plasma processor

PM216L

Features: High precision, fast response, good handling and compatibility, perfect functions and professional technical support.

Uses: Suitable for camera and industry, mobile phone manufacturing, semiconductor IC field, silicone, plastic, polymer field, automotive electronics industry, aviation industry, etc.

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Technical parameters Related Products

Number	Content	Specification Parameters
1	Machine specifications	1450mm(W)×1720mm(H)×1150 mm(D)
2	Vacuum Chamber Specifications	Imported aluminum 600(W)×600(H)×600(D)mm
3	Electrode Specifications	10-layer flat electrode plate（560(W)×500(D)mm）可定制
4	Control System	Touch screen + PLC control
5	Vacuum measurement system	Pirani resistance vacuum gauge
6	Gas Metering System	Accurate mass flow controller MFC
7	Number of gas channels	2-5 working gases are optional: Ar2, N2, H2, CF4, O2
8	Plasma generator	500W&1KW plasma source, 40KHz (optional 13.56MHz)
9	Working gas	2 working gases are optional: Ar2, N2, H2, O2
Features: High precision, fast response, good handling and compatibility, perfect functions and professional technical support. Uses: Suitable for camera and industry, mobile phone manufacturing, semiconductor IC field, silicone, plastic, polymer field, automotive electronics industry, aviation industry, etc. 1. Printed circuit board industry: surface activation of high-frequency boards, surface cleaning and desmearing of multi-layer boards, surface cleaning and desmearing of soft boards and soft-rigid boards, activation of soft boards before reinforcement. 2. Semiconductor IC field: COB, COG, COF, ACF process, used for wire bonding and cleaning before welding; 3. Silica gel, plastic, polymer field: surface roughening, etching, and activation of silica gel, plastic, and polymer .